M-SPIN 200 Spin Coater

  • Type Top Table or integrable module
  • 8” Wafer or 6” x 6” Substrates
  • The Spin Coater serves to homogeneously laquer, and dry wafers or substrates.
  • The M-spin is equipped with a locking mechanism for the lid, a completely graphical touch-panel with corresponding visualization.

Alteration right reservation to introduce improvements

Alteration right reservation to introduce improvements

  • Wafer sizes:
    Wafer up to 8″
    Substrates up to 6″x6″
  • Process bowl:
    Material PP
  • Lid:
    Maual lid, controlled by Sensor
  • Rotation speed:
    0-6000 rpm/sec, stepless adjustable
  • Programmable:
    99 Programs each 99 steps
  • Vacuum pump
  • Various chucks
  • Increasing of the Rotation speed to max. 10.000rpm
  • N2-Rinsing
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