HF Etching
- Etching
- Cleaning
- Manual loading or fully automatic handling options
- Single or dual chamber configurations
- 2″ – 8″ wafers or masks
- Etching side (front / back) selectable in recipe
- One-sided etching without backside masking
- Programmable handling arm(s)
- Polymer construction for acid / bases or stainless steel for solvent
- Multiple chuck designs and easy change out
- Touch screen interface
Dimensions
Alteration right reservation to introduce improvements
Technical data
Further Information after request
Accessories
- Quick change adapter for small substrates
- Multi-chuck for multiple wafer sizes
- Vacuum handling arm for individual substrate geometries
